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Proceedings Paper

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making
Author(s): Kazumasa Takeshi; Naoko Ito; Daisuke Inokuchi; Yasushi Nishiyama; Yuichi Fukushima; Yasuhiro Okumoto
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Paper Abstract

We investigated the film property and the lithographic performance of five commercialized NCARs. This report shows the relationship between chemical structure and EB lithographic performance, such as resolution, sensitivity and environmental stability. In this study, we found the good matching the matrix polymer, the cross linker and the photo acid generator(PAG) against NCARs issues. Furthermore, we could demonstrate the trade-off relation for lithographic factor and stabilized factor by chemical characteristics. This report suggests the strategy that was design of chemical structure for the next generation NCARs.

Paper Details

Date Published: 20 August 2004
PDF: 9 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557692
Show Author Affiliations
Kazumasa Takeshi, Toppan Printing Co., Ltd. (Japan)
Naoko Ito, Toppan Printing Co., Ltd. (Japan)
Daisuke Inokuchi, Toppan Printing Co., Ltd. (Japan)
Yasushi Nishiyama, Toppan Printing Co., Ltd. (Japan)
Yuichi Fukushima, Toppan Printing Co., Ltd. (Japan)
Yasuhiro Okumoto, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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