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Proceedings Paper

Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: an alternative approach for photolithography
Author(s): Gabriel Kerner; Ori Stein; Micha Asscher
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Paper Abstract

Buffer Layer Assisted Laser Patterning (BLALP) method is presented, for patterning metallic layers on surfaces, using laser desorption of a physisorbed buffer layer, e.g. Xe, CO2 or H2O. This technique is based on the utilization of a low power laser pulse used as the photolithographic printer of a metallic thin film. Using a weakly bound buffer material as the template for laser patterning, led to the development of two complementary procedures, 'positive' and 'negative' BLALP. It is discussed as a potential alternative for standard photo-lithography, promising a cleaner, more cost effective, better resolution and more environmentally friendly procedure.

Paper Details

Date Published: 14 October 2004
PDF: 9 pages
Proc. SPIE 5513, Physical Chemistry of Interfaces and Nanomaterials III, (14 October 2004); doi: 10.1117/12.557621
Show Author Affiliations
Gabriel Kerner, Hebrew Univ. of Jerusalem (Israel)
Ori Stein, Hebrew Univ. of Jerusalem (Israel)
Micha Asscher, Hebrew Univ. of Jerusalem (Israel)


Published in SPIE Proceedings Vol. 5513:
Physical Chemistry of Interfaces and Nanomaterials III
Gregory V. Hartland; Xiao-Yang Zhu, Editor(s)

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