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Proceedings Paper

Multilayer optics for Mo-radiation-based crystallography
Author(s): Arjen B. Storm; Carsten Michaelsen; Alexandra Oehr; Christian Hoffmann
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Paper Abstract

We present an optic for laboratory Mo-Kalpha single crystal diffraction systems. The optic is comprised of two elliptically bent focusing multilayers, which are arranged in the Montel scheme. The paper shows the design and performance of the optic. A comparison with a graphite monochromator shows a five-fold intensity enhancement. Especially small and weakly diffracting crystals benefit from the large intensity produced by the optic, as illustrated by diffraction analyses.

Paper Details

Date Published: 3 November 2004
PDF: 5 pages
Proc. SPIE 5537, X-Ray Sources and Optics, (3 November 2004); doi: 10.1117/12.557153
Show Author Affiliations
Arjen B. Storm, Bruker Nonius BV (Netherlands)
Carsten Michaelsen, Incoatec GmbH (Germany)
Alexandra Oehr, Incoatec GmbH (Germany)
Christian Hoffmann, Incoatec GmbH (Germany)

Published in SPIE Proceedings Vol. 5537:
X-Ray Sources and Optics
Carolyn A. MacDonald; Albert T. Macrander; Tetsuya Ishikawa; Christian Morawe; James L. Wood, Editor(s)

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