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Proceedings Paper

EUV lithography: main challenges
Author(s): Vadim Banine; Josef P.H. Benschop
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Paper Details

Date Published: 28 May 2004
PDF: 7 pages
Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); doi: 10.1117/12.556943
Show Author Affiliations
Vadim Banine, ASML (Netherlands)
Josef P.H. Benschop, ASML (Netherlands)

Published in SPIE Proceedings Vol. 5401:
Micro- and Nanoelectronics 2003
Kamil A. Valiev; Alexander A. Orlikovsky, Editor(s)

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