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Proceedings Paper

Fabrication of diffractive optical elements with grayscale photo-lithography
Author(s): Wan-chin Kim; Myung-bok Lee; Jin-seung Sohn; Eun-hyung Cho; Chan-young Yoon; No-cheol Park; Young-pil Park
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Paper Abstract

We have developed diffractive optical element (DOE) to compensate chromatic aberration happened in aspheric lens surfaces in micro optical system. The DOE was generated with grayscale lithography using high-energy-beam-sensitive (HEBS)-glass, and we finally obtained DOEs having 4levels and 8levels through this fabrication.

Paper Details

Date Published: 9 September 2004
PDF: 11 pages
Proc. SPIE 5380, Optical Data Storage 2004, (9 September 2004); doi: 10.1117/12.556684
Show Author Affiliations
Wan-chin Kim, Yonsei Univ. (South Korea)
Myung-bok Lee, Samsung Advanced Institute of Technology (South Korea)
Jin-seung Sohn, Samsung Advanced Institute of Technology (South Korea)
Eun-hyung Cho, Samsung Advanced Institute of Technology (South Korea)
Chan-young Yoon, Yonsei Univ. (South Korea)
No-cheol Park, Yonsei Univ. (South Korea)
Young-pil Park, Yonsei Univ. (South Korea)

Published in SPIE Proceedings Vol. 5380:
Optical Data Storage 2004
B. V. K. Vijaya Kumar; Hiromichi Kobori, Editor(s)

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