Share Email Print
cover

Proceedings Paper

Compact debris-free EUV source for advanced mirror metrology
Author(s): Andre Egbert; Boris Tkachenko; Stefan Becker; Boris N. Chichkov
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A compact electron-based extreme ultraviolet (EUV) source for advanced at-wavelength mirror metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This allows the realization of a flexible, debris-free, and long-term stable EUV source. In the EUV tube, silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different applications of the EUV tube in the field of at-wavelength mirror metrology are presented.

Paper Details

Date Published: 18 October 2004
PDF: 9 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.554892
Show Author Affiliations
Andre Egbert, phoenix|euv Systems + Services GmbH (Germany)
Boris Tkachenko, phoenix|euv Systems + Services GmbH (Germany)
Stefan Becker, phoenix|euv Systems + Services GmbH (Germany)
Boris N. Chichkov, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

© SPIE. Terms of Use
Back to Top