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Proceedings Paper

Analysis of plasma-controlled laser evaporation of Al target in vacuum
Author(s): Vladimir I. Mazhukin; Vadim V. Nossov; Igor Yu. Smurov
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Paper Abstract

The plasma-controlled evaporation of the Al target induced by the laser pulse with intensity of 8 x 108 W/cm2 and wavelength of 1.06 μm is analyzed with account for the two-dimensional effects. The self consistent model is applied, consisting of the heat transfer equation in condensed medium, the system of radiation gas dynamics in evaporated substance, and the Knudsen layer model at the two media boundary. It is established that the phase transition of the target surface is controlled by the two factors: the surface temperature that depends on the transmitted radiation intensity and the plasma pressure, governed by the expansion regime. The process comes through three characteristics stages -- the sonic evaporation at the beginning, the condensation during the period of plasma formation and initial expansion and, finally, the recommence of evaporation in subsonic regime after the partial brightening of the plasma. During the subsonic evaporation stage the vapor flow and the mass removal rate is much higher near the beam boundaries than in the center due to smaller plasma counter-pressure. The vapor plasma pattern is characterized by the dense hot zone near the surface where the deposition of laser energy occurs, and rapid decrease of density outside the zone due to three-dimensional expansion. The application of the laser beam of smaller radius at the same intensity leads to the formation of more rarefied and more transparent plasma, that allows to improve the mass removal efficiency.

Paper Details

Date Published: 2 April 2004
PDF: 12 pages
Proc. SPIE 5399, Laser-Assisted Micro- and Nanotechnologies 2003, (2 April 2004); doi: 10.1117/12.552987
Show Author Affiliations
Vladimir I. Mazhukin, Institute of Mathematical Modeling (Russia)
Vadim V. Nossov, Institute of Mathematical Modeling (Russia)
Igor Yu. Smurov, Ecole Nationale d'Ingenieurs de Saint-Etienne (France)


Published in SPIE Proceedings Vol. 5399:
Laser-Assisted Micro- and Nanotechnologies 2003
Vadim P. Veiko, Editor(s)

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