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Proceedings Paper

Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs
Author(s): De A. Clarke; Steven L. Allen; Gregory D. Wirth; Andrew C. Phillips
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Paper Abstract

This paper documents the astrometric slitmask design, submission, fabrication, control and configuration tools used for two large spectrographs at W. M. Keck Observatory on Mauna Kea, Hawai'i. For supplemental illustrations and documents, including an online version of the poster and interactive demos, we refer the reader to http://spg.ucolick.org/Docs/SPIE/2004 .

Paper Details

Date Published: 15 September 2004
PDF: 12 pages
Proc. SPIE 5496, Advanced Software, Control, and Communication Systems for Astronomy, (15 September 2004); doi: 10.1117/12.552300
Show Author Affiliations
De A. Clarke, Univ. of California Observatories/Lick Observatory (United States)
Steven L. Allen, Univ. of California Observatories/Lick Observatory (United States)
Gregory D. Wirth, W.M. Keck Observatory (United States)
Andrew C. Phillips, Univ. of California Observatories/Lick Observatory (United States)


Published in SPIE Proceedings Vol. 5496:
Advanced Software, Control, and Communication Systems for Astronomy
Hilton Lewis; Gianni Raffi, Editor(s)

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