Share Email Print
cover

Proceedings Paper

Modeling of dielectric polarization during an electron beam exposure
Author(s): S. S. Borisov; Eugene A. Grachev; S. I. Zaitsev; N. N. Negulyaev; E. A. Cheremukhin
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

On the basis of Monte-Carlo method a new approach to modeling of an electron interaction with a substance is offered. Some phenomena concerned with spatial energy distribution and accumulation of a charge in an irradiated sample are considered. Calculations of distributions of electric potential and resists polarization induced by an injected charge are presented. It is shown that charging is still the essential circumstance, capable to cause significant loss of accuracy in electron-beam lithography.

Paper Details

Date Published: 1 March 2004
PDF: 8 pages
Proc. SPIE 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 March 2004); doi: 10.1117/12.552222
Show Author Affiliations
S. S. Borisov, Moscow State Univ. (Russia)
Eugene A. Grachev, Moscow State Univ. (Russia)
S. I. Zaitsev, Institute of Problems of Microelectronics Technology (Russia)
N. N. Negulyaev, Moscow State Univ. (Russia)
E. A. Cheremukhin, Moscow State Univ. (Russia)


Published in SPIE Proceedings Vol. 5398:
Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics

© SPIE. Terms of Use
Back to Top