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Proceedings Paper

Effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight
Author(s): Andrey A. Zhukov; Svetlana A. Zhukova; Galina A. Korneeva; Yury S. Tchetverov
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Paper Abstract

The relationship between the rate of plasma-chemical etching of coatings and the molecular weight of polyamidoacid, made from pyrromelite dianhydride and dianiline oxide, and the chemical composition of polyimides is studied. It has been shown by IR spectroscopy that plasma-chemical etching does not produced any chemeical transformation in the bulk of totally imidized coatings. The improvement of adhesion characteristics of the PMDA-ODA coating materials is revealed.

Paper Details

Date Published: 1 March 2004
PDF: 8 pages
Proc. SPIE 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 March 2004); doi: 10.1117/12.552210
Show Author Affiliations
Andrey A. Zhukov, Cyclone Federal Research and Production Institute (Russia)
Svetlana A. Zhukova, Cyclone Federal Research and Production Institute (Russia)
Galina A. Korneeva, A.V. Topchiev Institute of Petrochemical Synthesis (Russia)
Yury S. Tchetverov, Cyclone Federal Research and Production Institute (Russia)


Published in SPIE Proceedings Vol. 5398:
Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics

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