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Proceedings Paper

Polyimide coating texture development by ECR-plasma etching
Author(s): Petr G. Babaevsky; Andrey A. Zhukov; Svetlana A. Zhukova; Yury S. Tchetverov; Sergei Yu. Shapoval
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Paper Abstract

Effect of chemical composition and imidization temperature of thin polyimide coatings on etching rate in oxygen plasma generated by electron cyclotron resonance source at different bias voltage potential (ion energy) and time of the process was studied. A correlation of plasmochemical etching rate and topology pattern profile of the polyimide coatings at different etching conditions was determined.

Paper Details

Date Published: 1 March 2004
PDF: 5 pages
Proc. SPIE 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 March 2004); doi: 10.1117/12.552179
Show Author Affiliations
Petr G. Babaevsky, Tsiolkovsky Russian State Technological Univ. (Russia)
Andrey A. Zhukov, Cyclone Federal Research and Production Institute (Russia)
Svetlana A. Zhukova, Cyclone Federal Research and Production Institute (Russia)
Yury S. Tchetverov, Cyclone Federal Research and Production Institute (Russia)
Sergei Yu. Shapoval, Institute of Problems of Microelectronics (Russia)


Published in SPIE Proceedings Vol. 5398:
Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics
Anatoly M. Filachev, Editor(s)

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