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Proceedings Paper

Silicon immersion gratings for very high-resolution infrared spectroscopy
Author(s): Daniel Ludlow McDavitt; Jian Ge; Shane Miller; Junfeng Wang
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Paper Abstract

In our group, development of large format silicon immersion gratings with sizes up to 4 inches in diameter is a routine practice. The first silicon anamorphic immersion grating has an 80x50 mm2 etched grating area, a 63.5° blazed angle and a 5.4 l/mm groove density (or 185 μm period) on a 30mm thick silicon substrate. The groove density is about 4 times coarser than any existing commercial echelle grating, allowing a complete coverage of a cross-dispersed echelle spectrum on a 1k x 1k IR array at R = 220,000 in the K band. The optical measurements show the grating has a high quality wavefront and surface. The rms wavefront error is 0.125 waves and the integrated scattered light is ~1% at 0.6328 nm. A silicon immersion grating with an 85x50 mm2 etched area, a 54.7° blazed angle and 16.1 l/mm groove density on a 40 mm thickness allows for complete wavelength coverage of 1.2-2.4 μm on a 2kx2k IR array. We are in the middle of processing a silicon disk with a 6 inch diameter and 2.5 inch thickness to make a large format silicon immersion grating for the Gemini next generation Advanced Cryogenic Echelle Spectrograph (ACES) and space applications.

Paper Details

Date Published: 24 September 2004
PDF: 9 pages
Proc. SPIE 5494, Optical Fabrication, Metrology, and Material Advancements for Telescopes, (24 September 2004); doi: 10.1117/12.552028
Show Author Affiliations
Daniel Ludlow McDavitt, The Pennsylvania State Univ. (United States)
Univ. of Florida (United States)
Jian Ge, The Pennsylvania State Univ. (United States)
Univ. of Florida (United States)
Shane Miller, The Pennsylvania State Univ. (United States)
Univ. of Florida (United States)
Junfeng Wang, The Pennsylvania State Univ. (United States)
Univ. of Florida (United States)


Published in SPIE Proceedings Vol. 5494:
Optical Fabrication, Metrology, and Material Advancements for Telescopes
Eli Atad-Ettedgui; Philippe Dierickx, Editor(s)

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