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Proceedings Paper

Mapping of localized surface plasmon fields via exposure of a photosensitive polymer
Author(s): Anna Rumyantseva; Sergei Kostcheev; Johan Grand; Christophe Hubert; Renaud Bachelot; Gilles Lerondel; Pierre Michel Adam; Pascal Royer
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Paper Abstract

We present a method for mapping the electromagnetic field distribution in the vicinity of noble metal nanoparticles able to sustain localised surface plasmon resonance (LSPR). The field distribution is coded by topographic change in a self-developing photosensitive polymer (PMMA-DR1). Metallic nanostructures are fabricated by e-beam lithography and optically characterised by extinction spectroscopy. Photoinduced topographic changes are checked by means of atomic force microscopy (AFM). The dipolar character of the surface modification around the particles agrees qualitatively with theoretical predictions and a strong correlation between LSPR position and the relief depth is found.

Paper Details

Date Published: 15 September 2004
PDF: 8 pages
Proc. SPIE 5450, Photonic Crystal Materials and Nanostructures, (15 September 2004); doi: 10.1117/12.550100
Show Author Affiliations
Anna Rumyantseva, LNIO, Univ. de Technologie de Troyes (France)
Sergei Kostcheev, LNIO, Univ. de Technologie de Troyes (France)
Johan Grand, LNIO, Univ. de Technologie de Troyes (France)
Christophe Hubert, LNIO, Univ. de Technologie de Troyes (France)
Renaud Bachelot, LNIO, Univ. de Technologie de Troyes (France)
Gilles Lerondel, LNIO, Univ. de Technologie de Troyes (France)
Pierre Michel Adam, LNIO, Univ. de Technologie de Troyes (France)
Pascal Royer, LNIO, Univ. de Technologie de Troyes (France)


Published in SPIE Proceedings Vol. 5450:
Photonic Crystal Materials and Nanostructures
Richard M. De La Rue; Pierre Viktorovitch; Clivia M. Sotomayor Torres; Michele Midrio, Editor(s)

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