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Proceedings Paper

Optimal physical conditions for extreme UV generation
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Paper Abstract

As is known in literature are discussed the number of methods of high power EUV sources creation for EUV lithography including laser application, micro pinch, plasma focus, capillary discharge etc. The aim of this paper is to find the optimal physical conditions in plasma as EUV source taking into account, before all, the kinetics an transfer of light quantum. It is shown that the efficiency of plasma EUV source depends, in the main, on material of target, density of electrons and their temperature. In conclusion a variant of creating an alternative ("linear") EUV source on the basis of self-compression of plasma shells in the regime of slow energy input is considered.

Paper Details

Date Published: 20 September 2004
PDF: 7 pages
Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004); doi: 10.1117/12.548740
Show Author Affiliations
Anatoliy F. Nastoyashchii, Troitsk Institute for Innovation and Fusion Research (Russia)


Published in SPIE Proceedings Vol. 5448:
High-Power Laser Ablation V
Claude R. Phipps, Editor(s)

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