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Proceedings Paper

High-resolution EUV microstepper tool for resist testing and technology evaluation
Author(s): Adam Brunton; Julian Cashmore; Peter Elbourn; Graeme Elliner; Malcolm C. Gower; Philipp Grunewald; M. Harman; S. Hough; N. McEntee; S. Mundair; D. Rees; P. Richards; V. Truffert; Ian Wallhead; Mike Whitfield
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Paper Abstract

Key features are presented of the Exitech MS-13 EUV Microstepper tool developed for EUV resist testing & technology evaluation at the 32nm node and beyond. Details of the tool design architecture, module layout, vacuum chamber, major subsystems including source, optics and performance specifications are given.

Paper Details

Date Published: 20 May 2004
PDF: 12 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.548343
Show Author Affiliations
Adam Brunton, Exitech Ltd. (United Kingdom)
Julian Cashmore, Exitech Ltd. (United Kingdom)
Peter Elbourn, Exitech Ltd. (United Kingdom)
Graeme Elliner, Exitech Ltd. (United Kingdom)
Malcolm C. Gower, Exitech Ltd. (United Kingdom)
Philipp Grunewald, Exitech Ltd. (United Kingdom)
M. Harman, Exitech Ltd. (United Kingdom)
S. Hough, Exitech Ltd. (United Kingdom)
N. McEntee, Exitech Ltd. (United Kingdom)
S. Mundair, Exitech Ltd. (United Kingdom)
D. Rees, Exitech Ltd. (United Kingdom)
P. Richards, Exitech Ltd. (United Kingdom)
V. Truffert, Exitech Ltd. (United Kingdom)
Ian Wallhead, Exitech Ltd. (United Kingdom)
Mike Whitfield, Exitech Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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