Share Email Print

Proceedings Paper

Synthesis of projection lithography for low k1 via interferometry
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The aerial image attained from an optical projection photolithography system is ultimately limited by the frequency information present in the pupil plane of the objective lens. Careful examination of the frequency distribution will allow the operation of such a system to be synthesized experimentally through the use of interferometric lithography. Synthesis is accomplished through single beam attenuation in a two-beam interference system, which is equivalent to adjusting the relative intensities of the primary diffraction orders in a projection system. Typical lithography conditions, such as defocus and partial coherence, can be synthesized efficiently using this technique. The metric of contrast has been utilized to assess the level of correlation between defocus in a projection system and interferometric synthesis. Simulations have shown that interferometric lithography can approximate the performance of a variety of projection system configurations with a significantly high degree of accuracy.

Paper Details

Date Published: 28 May 2004
PDF: 7 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.547727
Show Author Affiliations
Frank Charles Cropanese, Rochester Institute of Technology (United States)
Anatoly Bourov, Rochester Institute of Technology (United States)
Yongfa Fan, Rochester Institute of Technology (United States)
Andrew Estroff, Rochester Institute of Technology (United States)
Lena V. Zavyalova, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

© SPIE. Terms of Use
Back to Top