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Proceedings Paper

Compact electron-based EUV source for at-wavelength metrology
Author(s): Andre Egbert; Boris Tkachenko; Stefan Becker; Boris N. Chichkov
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Paper Abstract

A compact electron-based extreme ultraviolet (EUV) source for at-wavelength metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This allows the realization of a flexible, debris-free, and long-term stable EUV source. In the EUV tube, silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different applications of the EUV tube in the field of at-wavelength metrology are presented.

Paper Details

Date Published: 20 September 2004
PDF: 11 pages
Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004); doi: 10.1117/12.547029
Show Author Affiliations
Andre Egbert, phoenix|euv Systems + Services GmbH (Germany)
Boris Tkachenko, phoenix|euv Systems + Services GmbH (Germany)
Stefan Becker, phoenix|euv Systems + Services GmbH (Germany)
Boris N. Chichkov, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 5448:
High-Power Laser Ablation V
Claude R. Phipps, Editor(s)

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