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Proceedings Paper

Nanostructure fabrication by femtosecond laser with near-field optical enhancement effect
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Paper Abstract

We will report on nanostructure fabrication on silicon (Si) substrate by 800 nm femtosecond laser pulses. Spherical alumina particles were placed on the substrate surface. After femtosecond laser irradiation at below-ablation-threshold fluences, we have successfully observed the nanoholes formation with around 100 nm in diameter using scanning electron microscope (SEM) and atomic force microscope (AFM). The dependence of nanohole formation on the laser fluence and laser pulse number was investigated. The mechanism for the nanohole drilling is the near-field optical enhancement effect induced by interaction between local surface plasmon on the particles surface and surface plasmon polariton on the Si substrate surface.

Paper Details

Date Published: 20 September 2004
PDF: 8 pages
Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004); doi: 10.1117/12.546828
Show Author Affiliations
Hiroto Takada, Keio Univ. (Japan)
Masanao Kamata, Keio Univ. (Japan)
Yoshihiro Hagiwara, Keio Univ. (Japan)
Minoru Obara, Keio Univ. (Japan)


Published in SPIE Proceedings Vol. 5448:
High-Power Laser Ablation V
Claude R. Phipps, Editor(s)

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