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Proceedings Paper

The rising cost and complexity of RETs
Author(s): Mark E. Mason
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Paper Abstract

For the last several years, Resolution Enhancement Technologies (RETs) have helped make it possible for lithographers to stay on the path set for them by Goordon Moore. Though seldom discussed in detail, these RETs have a real cost in terms of data file size, computation times, complexity of metrology and inspection, licenses fees, manpower and delay. The International Sematech Cost of Ownership (CoO) analysis can be used to estimate the impact of RETs on overall Lithography CoO and on the cost per modern semiconductor wafer, which appears to be around $10/ RET level for a high-volume ASIC case.

Paper Details

Date Published: 3 May 2004
PDF: 10 pages
Proc. SPIE 5379, Design and Process Integration for Microelectronic Manufacturing II, (3 May 2004); doi: 10.1117/12.546794
Show Author Affiliations
Mark E. Mason, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 5379:
Design and Process Integration for Microelectronic Manufacturing II
Lars W. Liebmann, Editor(s)

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