Share Email Print
cover

Proceedings Paper

Active membrane masks for improved overlay performance in proximity lithography
Author(s): Dryver R. Huston; James Plumpton; Brian Esser; Gerald A. Sullivan
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Membrane masks are thin (2 micron x 35 mm x 35 mm) structures that carry the master exposure patterns in proximity (X-ray) lithography. With the continuous drive to the printing of ever-finer features in microelectronics, the reduction of mask-wafer overlay positioning errors by passive rigid body positioning and passive stress control in the mask becomes impractical due to nano and sub-micron scale elastic deformations in the membrane mask. This paper describes the design, mechanics and performance of a system for actively stretching a membrane mask in-plane to control overlay distortion. The method uses thermoelectric heating/cooling elements placed on the mask perimeter. The thermoelectric elements cause controlled thermoelastic deformations in the supporting wafer, which in turn corrects distortions in the membrane mask. Silicon carbide masks are the focus of this study, but the method is believed to be applicable to other mask materials, such as diamond. Experimental and numerical results will be presented, as well as a discussion of the design issues and related design decisions.

Paper Details

Date Published: 29 July 2004
PDF: 9 pages
Proc. SPIE 5388, Smart Structures and Materials 2004: Industrial and Commercial Applications of Smart Structures Technologies, (29 July 2004); doi: 10.1117/12.546598
Show Author Affiliations
Dryver R. Huston, Univ. of Vermont (United States)
James Plumpton, Univ. of Vermont (United States)
Brian Esser, Univ. of Vermont (United States)
Gerald A. Sullivan, JMAR/SAL (United States)


Published in SPIE Proceedings Vol. 5388:
Smart Structures and Materials 2004: Industrial and Commercial Applications of Smart Structures Technologies
Eric H. Anderson, Editor(s)

© SPIE. Terms of Use
Back to Top