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Paper Abstract

The objective of this paper is to study the polarization induced by mask structures. Rigorous coupled-wave analysis (RCWA) was used to study the interaction of electromagnetic waves with mask features. RCWA allows the dependence of polarization effects of various wavelengths of radiation on grating pitch, profile, material, and thickness to be studied. The results show that for the five different mask materials examined, the material properties, mask pitch, and illumination all have a large influence on how the photomask polarizes radiation.

Paper Details

Date Published: 28 May 2004
PDF: 12 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.546423
Show Author Affiliations
Andrew Estroff, Rochester Institute of Technology (United States)
Yongfa Fan, Rochester Institute of Technology (United States)
Anatoly Bourov, Rochester Institute of Technology (United States)
Frank Charles Cropanese, Rochester Institute of Technology (United States)
Neal Vincent Lafferty, Rochester Institute of Technology (United States)
Lena V. Zavyalova, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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