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Proceedings Paper

Makyoh topography: a simple yet powerful optical method for flatness and defect characterization of mirror-like surfaces
Author(s): Ferenc Riesz
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Paper Abstract

Makyoh topography is an optical surface defect and flatness characterization tool. Its operation principle is based on the whole-field reflection of a collimated beam and defocused detection. This paper reviews the history, the basic principles and applications of the method. The problem of quantitativity is discussed in detail and the solutions are described. The accuracy limits are discussed. Application examples are shown from semiconductor wafer processing and MEMS technology. Comparison is made to related optical and other topographic techniques.

Paper Details

Date Published: 17 August 2004
PDF: 15 pages
Proc. SPIE 5458, Optical Micro- and Nanometrology in Manufacturing Technology, (17 August 2004); doi: 10.1117/12.546018
Show Author Affiliations
Ferenc Riesz, Research Institute for Technical Physics and Materials Science (Hungary)


Published in SPIE Proceedings Vol. 5458:
Optical Micro- and Nanometrology in Manufacturing Technology
Christophe Gorecki; Anand K. Asundi, Editor(s)

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