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Proceedings Paper

Phenomena and OPC solution of ripple patterns for 65-nm node
Author(s): Chih-Ming Lai; Jeng-Shiun Ho; Chien-Wen Lai; Cheng-Kun Tsai; Cherng-Shyan Tsay; Jeng-Horng Chen; Ru-Gun Liu; Yao Ching Ku; Burn-Jeng Lin
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Paper Abstract

The ripple patterns induced by the lithography process will lead to unpredictable necking or bridging risks on circuit patterns. This phenomenon is particularly severe while using the attenuated-phase-shifting mask combined with the strong off-axis illumination. The CD variation induced by the ripple effect is difficult to be accurately corrected by conventional OPC approaches. In this paper, ripples on patterning for the 65nm node have been studied and their problems solved. One of the dominant root causes of ripples is the optical side-lobes from the surrounding patterns. On the L-shape patterns for example, the ripples that occur on the horizontal lines are induced by the side-lobes of the vertical lines. Based on this study of the ripple effect, the layout types resulting in ripple patterns can be classified and predicted. An advanced OPC approach by the segmentation analysis on polygons as well as the correction algorithm optimization has been developed and applied to solve this ripple problem.

Paper Details

Date Published: 28 May 2004
PDF: 7 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.544250
Show Author Affiliations
Chih-Ming Lai, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jeng-Shiun Ho, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chien-Wen Lai, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Cheng-Kun Tsai, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Cherng-Shyan Tsay, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jeng-Horng Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Ru-Gun Liu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yao Ching Ku, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Burn-Jeng Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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