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Proceedings Paper

Assessing the impact of intrinsic birefringence on 157-nm lithography
Author(s): Nakgeuon Seong; Kafai Lai; Alan E. Rosenbluth; Gregg M. Gallatin
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Paper Abstract

Birefringence can be represented using the matrix generated by multiplying together Jones matrices for the separate lens elements. Conventional vector imaging methods, which use orthogonal electric field components in resist combined to yield the intensity, can be extended to handle this matrix representation of the optical pupil. The mean amplitude ratio of the off-diagonal elements in the matrix pupil is shown to correspond quite well to the birefringence-induced CD error.

Paper Details

Date Published: 28 May 2004
PDF: 5 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.544242
Show Author Affiliations
Nakgeuon Seong, IBM Microelectronics Div. (United States)
Kafai Lai, IBM Microelectronics Div. (United States)
Alan E. Rosenbluth, IBM Thomas J. Watson Research Ctr. (United States)
Gregg M. Gallatin, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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