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Proceedings Paper

Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication
Author(s): A. Crunteanu; Markus Pollnau; G. Janchen; C. Hibert; Patrik Hoffmann; Rene-Paul Salathe; Robert William Eason; David P. Shepherd
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Paper Abstract

We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 μm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.

Paper Details

Date Published: 14 November 2003
PDF: 7 pages
Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); doi: 10.1117/12.543706
Show Author Affiliations
A. Crunteanu, Swiss Federal Institute of Technology (Switzerland)
Markus Pollnau, Swiss Federal Institute of Technology (Switzerland)
G. Janchen, Swiss Federal Institute of Technology (Switzerland)
C. Hibert, Swiss Federal Institute of Technology (Switzerland)
Patrik Hoffmann, Swiss Federal Institute of Technology (Switzerland)
Rene-Paul Salathe, Swiss Federal Institute of Technology (Switzerland)
Robert William Eason, Univ. of Southampton (United Kingdom)
David P. Shepherd, Univ. of Southampton (United Kingdom)


Published in SPIE Proceedings Vol. 5147:
ALT'02 International Conference on Advanced Laser Technologies
Heinz P. Weber; Vitali I. Konov; Thomas Graf, Editor(s)

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