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Proceedings Paper

Siloxane-based polymer epoxies for optical waveguides
Author(s): S. Ponoth; Peter D. Persans; Ram Ghoshal; N. Agarwal; Joel L. Plawsky; A. Filin; Q. Z. Fang
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Paper Abstract

We introduce a new class of siloxane-based epoxy polymers for thin film optical waveguide applications. The thickness of spun-on films can be controlled by varying either spin speed or viscosity using solvents. Cured films exhibit excellent adhesion to silicon oxide and Al and excellent thermal and chemical stability. Waveguides of ~2 micron thickness on silicon oxide exhibit <0.2dB/cm loss at 830 nm. We demonstrate the formation of a 45° vertical mirror using reactive ion etching slope transfer from photoresist to epoxy polymer film.

Paper Details

Date Published: 15 December 2003
PDF: 5 pages
Proc. SPIE 5260, Applications of Photonic Technology 6, (15 December 2003); doi: 10.1117/12.543436
Show Author Affiliations
S. Ponoth, Rensselaer Polytechnic Institute (United States)
Peter D. Persans, Rensselaer Polytechnic Institute (United States)
Ram Ghoshal, Polyset Chemical Co. Inc. (United States)
N. Agarwal, Rensselaer Polytechnic Institute (United States)
Joel L. Plawsky, Rensselaer Polytechnic Institute (United States)
A. Filin, Rensselaer Polytechnic Institute (United States)
Q. Z. Fang, Rensselaer Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 5260:
Applications of Photonic Technology 6

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