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Proceedings Paper

Carbon buffer layers for smoothing substrates of EUV and x-ray multilayer mirrors
Author(s): Stefan Braun; Beatrice Bendjus; Thomas Foltyn; Maik Menzel; Juergen Schreiber; Danny Weissbach
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Paper Abstract

Smoothing of surfaces by thin film deposition is facilitated by methods which release hyperthermal particles on the substrate. One of these techniques is pulsed laser deposition (PLD), with high kinetic particle energies of up to several 100 eV. The concrete energy distribution of the particles can be widely influenced by the laser power density. We investigated the deposition of carbon layers by PLD on numerous substrates with rms-roughnesses between 0.15 and 0.75 nm using different laser power densities and film thicknesses. It turns out that a better smoothing can be obtained with higher laser power densities, whereby diamond-like carbon films are created. With typical thicknesses of dC = 100 nm, the rms-roughness is reduced from 0.75 nm to 0.55 nm and from 0.32 nm to 0.18 nm. Accordingly by applying smoothing carbon buffer layers, the EUV reflectance of Mo/Si multilayers on rough substrates is increased from typically 60% to > 65% on substrates with initial roughnesses of 0.75 nm.

Paper Details

Date Published: 21 July 2004
PDF: 9 pages
Proc. SPIE 5392, Testing, Reliability, and Application of Micro- and Nano-Material Systems II, (21 July 2004); doi: 10.1117/12.541365
Show Author Affiliations
Stefan Braun, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Beatrice Bendjus, Fraunhofer-Institut fur Zerstoerungsfreie Prueverfahren (Germany)
Thomas Foltyn, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Maik Menzel, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Juergen Schreiber, Fraunhofer-Institut fur Zerstoerungsfreie Pruefverfahren (Germany)
Danny Weissbach, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)


Published in SPIE Proceedings Vol. 5392:
Testing, Reliability, and Application of Micro- and Nano-Material Systems II
Norbert Meyendorf; George Y. Baaklini; Bernd Michel, Editor(s)

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