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Proceedings Paper

EUV emission of solid targets irradiated by femto- and picosecond laser pulses
Author(s): Georg Soumagne; Tamotsu Abe; Kenichi Ikeda; Hiroshi Komori; Hiroshi Someya; Takashi Suganuma; Kazuhisa Nakajima; Akira Endo
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Paper Abstract

Various solid materials have been irradiated with laser intensities ranging from 1011 to 1016 W/cm2 and the plasma emission has been measured between 7 nm and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790 nm with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 nm with 10 ns pulse duration (fwhm) have been used. Tin, aluminum and copper have been chosen as targets. It has been found that the plasma emission was strongest for the 300 ps laser pulse irradiation. This might be due to the additional laser plasma heating during plasma formation.

Paper Details

Date Published: 18 November 2003
PDF: 4 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.541149
Show Author Affiliations
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Kenichi Ikeda, Graduate Univ. for Advanced Studies (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Someya, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazuhisa Nakajima, Graduate Univ. for Advanced Studies (Japan)
High Energy Accelerator Research Organization (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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