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Proceedings Paper

Fabrication of diffractive phase elements by F2-laser ablation of fused silica
Author(s): Malte Schulz-Ruthenberg; Juergen Ihlemann; Gerd Marowsky; Amir H. Nejadmalayeri; Mi Li Ng; Jianzhao Li; Peter R. Herman
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Paper Abstract

F2-laser ablation at 157 nm was used for generating sub-micron surface relief structures on fused silica to define binary diffractive phase elements (DPE). A pattern array of 128 x 128 pixels was excised using the F2 laser in combination with a high resolution processing system comprising of CaF2 beam-homogenization optics and a high-resolution Schwarzschild reflective objective. A square projection mask provided precise excisions in less than 10 x 10 μm2 spots, having sub-μm depths that were controlled by the laser fluence and the number of laser pulses to provide for the required phase delay between ablated and non-ablated pixels. Thus a diffractive phase element (DPE) optimized for first order in the UV spectral range was made. A four-level DPE design computed by the Iterative Fourier Transform Algorithm (IFTA) will be described for generating an arbitrary irradiation pattern without the point symmetry of a two level design.

Paper Details

Date Published: 18 November 2003
PDF: 5 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.541070
Show Author Affiliations
Malte Schulz-Ruthenberg, Laser-Lab. Goettingen e.V. (Germany)
Juergen Ihlemann, Laser-Lab. Goettingen e.V. (Germany)
Gerd Marowsky, Laser-Lab. Goettingen e.V. (Germany)
Amir H. Nejadmalayeri, Univ. of Toronto (Canada)
Mi Li Ng, Univ. of Toronto (Canada)
Jianzhao Li, Univ. of Toronto (Canada)
Peter R. Herman, Univ. of Toronto (Canada)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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