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Comparison of the structural characteristics and surface morphology of ZnO thin films grown on various substrates by pulsed laser deposition
Author(s): J. H. Kim; Kyoung-cheol Lee; Cheon Lee
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Paper Abstract

ZnO thin films on (100) p-type Si and sapphire substrates have been deposited by pulsed laser deposition technique using Nd:YAG laser with a wavelength of 266 nm. The influence of the deposition parameters such as oxygen pressure, substrate temperature and laser energy density on the properties of the grown films, was studied. The experiments were performed for substrates temperature in the range of 200 - 500°C and oxygen pressure in the range of 100 to approximately 700 sccm. All the films grown in this experiment show strong c-axis orientation with (002) textured ZnO peak. With increasing substrate temperature, the full width at half maximum (FWHM) and surface roughness were descreased. In case of sapphire substrate, the intensity of PL spectra increased with increasing ambient oxygen flow rate. We investigated in the structural and morphological properties of ZnO thin films using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM).

Paper Details

Date Published: 18 November 2003
PDF: 4 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.541058
Show Author Affiliations
J. H. Kim, Inha Univ. (South Korea)
Kyoung-cheol Lee, Inha Univ. (South Korea)
Cheon Lee, Inha Univ. (South Korea)

Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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