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Proceedings Paper

Preparation of channel waveguides with extremely thermally stabilized laser-induced gratings
Author(s): Hiroaki Nishiyama; Tomokazu Sano; Etsuji Ohmura; Isamu Miyamoto; Shin-ichi Matsumoto; Mitsunori Saito; Kenji Kintaka; Junji Nishii
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Paper Abstract

Waveguide filters with extremely thermally stabilized KrF laser-induced gratings were fabricated in the highly photosensitive Ge-B-SiO2 thin films. It was discovered that a completely new-type grating with high diffraction efficiency and thermal stability could be formed by annealing a conventional laser-induced grating at 600°C. Such thermally induced gratings couldn't be erased after repeated heat treatment alternating between room temperature and 600°C. We printed a grating in slab waveguide by irradiation with a KrF excimer laser followed by the annealing at 600°C, and then formed the channel in the region of the grating using standard photolithography process. The diffraction peak of 17 dB in depth at 1535.04 nm wavelength was observed after repeated heat treatment alternating between room temperature and 400°C. These thermally stabilized waveguide filters are promising candidate for the highly reliable optical and sensing devices.

Paper Details

Date Published: 18 November 2003
PDF: 4 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540896
Show Author Affiliations
Hiroaki Nishiyama, Osaka Univ. (Japan)
National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Tomokazu Sano, Osaka Univ. (Japan)
Etsuji Ohmura, Osaka Univ. (Japan)
Isamu Miyamoto, Osaka Univ. (Japan)
Shin-ichi Matsumoto, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Ryukoku Univ. (Japan)
Mitsunori Saito, Ryukoku Univ. (Japan)
Kenji Kintaka, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Junji Nishii, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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