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Proceedings Paper

Carbon nitride films synthesized by pulsed laser deposition with additional laser irradiation to plume
Author(s): Tatsuya Shinozaki; Toshihiko Ooie; Tetsuo Yano
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Paper Abstract

A carbon nitride film was synthesized by a pulsed laser deposition technique using an additional laser to irradiate the carbon plume. A highly oriented pyrolytic graphite target was ablated in a nitrogen atmosphere at a pressure of 0.1 torr. The optical emission intensities of ionic carbon and nitrogen from the carbon plume were increased by additional laser-irradiation. The ratio of N sp3-C bonds and nitrogen chemical content were also increased by the additional laser irradiation to the plume. The ratio of N sp3-C bonding and nitrogen content increased with additional laser irradiation at low but not high fluence from the ablating laser.

Paper Details

Date Published: 18 November 2003
PDF: 5 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540605
Show Author Affiliations
Tatsuya Shinozaki, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Toshihiko Ooie, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Tetsuo Yano, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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