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Proceedings Paper

Model for pulsed ultraviolet laser ablation
Author(s): N. Mansour; K. Jamshidi Ghaleh
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Paper Abstract

A theoretical model for laser ablation of polymers is developed. The model includes the description of radiation transport processes for the two-photon stepwise absorption of chromophores. This processes results in a nonlinear loss for the laser fluence, which can be expressed in term of the effective absorption coefficient αeff. The behavior of αeff as a function of incident fluence, applied wavelength, linear, excited state and plume absorption cross sections will be analyzed. This model accounts for a wide variety of observations such as fluence thresholds, wavelength and fluence dependent etch rates. An expression for the etch depth as a function of incident fluence is derived. It will be shown that the theoretical analysis describes accurately the trend of the noval photopolymers ablation results, which are recently reported in literature.

Paper Details

Date Published: 18 November 2003
PDF: 6 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540528
Show Author Affiliations
N. Mansour, Shahid Beheshti Univ. (Iran)
K. Jamshidi Ghaleh, Shahid Beheshti Univ. (Iran)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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