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Proceedings Paper

Principles and applications of laser-induced liquid-phase jet-chemical etching
Author(s): Andreas Stephen; Simeon Metev; Frank Vollertsen
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Paper Abstract

In this treatment method laser radiation, which is guided from a coaxially expanding liquid jet-stream, locally initiates a thermochemical etching reaction on a metal surface, which leads to selective material removal at high resolution and quality of the treated surface as well as low thermal influence on the workpiece. Electrochemical investigations were performed under focused laser irradiation using a cw-Nd:YAG laser with a maximum power of 15 W and a simultaneous impact of the liquid jet-stream consisting of phosphoric acid with a maximum flow rate of 20 m/s. The time resolved measurements of the electrical potential difference against an electrochemical reference electrode were correlated with the specific processing parameters and corresponding etch rates to identify processing conditions for temporally stable and enhanced chemical etching reactions. Applications of laser-induced liquid-phase jet-chemical etching in the field of sensor technology, micromechanics and micrmoulding technology are presented. This includes the microstructuring of thin film systems, cutting of foils of shape memory alloys or the generation of structures with defined shape in bulk material.

Paper Details

Date Published: 18 November 2003
PDF: 6 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540525
Show Author Affiliations
Andreas Stephen, Bremer Institut fuer Angewandte Strahltechnik (Germany)
Simeon Metev, Bremer Institut fuer Angewandte Strahltechnik (Germany)
Frank Vollertsen, Bremer Institut fuer Angewandte Strahltechnik (Germany)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication

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