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Proceedings Paper

Nanosecond laser micro machining using an external beam attenuator
Author(s): Johan Bosman; Henk Kettelarij; Corne J.G.M. de Kok
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Paper Abstract

The pulse width -- pulse energy relationship of a solid-state laser can reduce the accuracy of micro machined features. Our goal is to control a depth of a laser mark with an accuracy of 0.1 μm and reduce the line width below the spot diameter. Reaching this depth and width in a stable and industrial viable laser process would not have been possible without the additional control generated by the beam attenuator.

Paper Details

Date Published: 18 November 2003
PDF: 3 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540504
Show Author Affiliations
Johan Bosman, Philips Ctr. for Industrial Technology (Netherlands)
Henk Kettelarij, Philips Ctr. for Industrial Technology (Netherlands)
Corne J.G.M. de Kok, Philips Ctr. for Industrial Technology (Netherlands)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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