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Proceedings Paper

Surface microstructuring of transparent materials by laser-induced backside wet etching using excimer laser
Author(s): Hiroyuki Niino; Ximing Ding; Ryozo Kurosaki; Aiko Narazaki; Tadatake Sato; Yoshizo Kawaguchi
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Paper Abstract

Silica glass is an important material in optics and optoelectronics because of its outstanding properties, such as transparence in a wide wavelength range, strong damage resistance for laser irradiation, and high chemical stability. In order to develop simpler processes of micro-fabricating silica glass using a pulsed laser, we have investigated a one-step method to microfabricate a silica glass plate using laser-induced backside wet etching (LIBWE) upon irradiation with a ns-pulsed excimer laser. Our idea of LIBWE is based on the deposition of laser energy on the surface of silica glass using ablation of a dye solution. When the dye solution was ablated upon the laser irradiation, the etching of a surface layer was performed on the silica glass. We have succeeded in the micro-fabrication of such transparent materials as silica glass, quartz, calcium fluoride, sapphire and fluorocarbon resin. The advantages of our LIBWE method are as follows, (1) a lwo laser fluence and constant etch rate, (2) microfabrication without debris and cracks formation, (3) large area irradiation with an excimer laser beam through a mask projection, (4) simple pre/post-treatment on target substrates. This is a one-step process simpler method at ambient pressure, which would be used for mass production.

Paper Details

Date Published: 18 November 2003
PDF: 9 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540486
Show Author Affiliations
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Ximing Ding, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Ryozo Kurosaki, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)
Yoshizo Kawaguchi, National Institute of Advanced Industrial Science and Technology (AIST) (Japan)


Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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