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Proceedings Paper

Membrane mask aeroelastic and thermoelastic control
Author(s): Dryver R. Huston; James O. Plumpton; Brian Esser; Sonja Hoelzl; Xiaoguang Wang; Gerald A. Sullivan
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Paper Abstract

This paper describes the mechanics and control of mechanical distortions imposed on membrane masks during proximity (X-ray) lithography. Two sources of mechanical distortions are examined. The first is aeroelastic distortion caused by the coupling of aerodynamic fluid forces in the gap between the membrane and the wafer with the elastic mechanics of the membrane. Aerodynamic loadings on the membrane arise when the gap between mask and wafer is adjusted and during lateral stepping maneuvers. Results of stepping and gap closing experiments are presented. The results are correlated with numerical calculations based on Reynolds lubrication equation. Possible methods for reducing these aeroelastic distortions are examined. The second set of mechanical distortions contains those that give rise to some of the in-plane overlay errors. A thermoelastic technique for controlling in-plane errors using thermoelectric devices placed on the mask perimeter is described. Numerical and experimental results are presented.

Paper Details

Date Published: 20 May 2004
PDF: 11 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.540374
Show Author Affiliations
Dryver R. Huston, Univ. of Vermont (United States)
James O. Plumpton, Univ. of Vermont (United States)
Brian Esser, Univ. of Vermont (United States)
Sonja Hoelzl, Univ. of Vermont (United States)
Technical Univ. of Munich (Germany)
Xiaoguang Wang, Univ. of Vermont (United States)
Gerald A. Sullivan, JMAR/SAL Nanotechnologies, Inc. (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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