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Proceedings Paper

Study on improvement of resolution in photolithographic patterns with pupil phase-shift filtering
Author(s): Xunan Chen; Jianping Shi; Xiangang Luo; Xiqiao Kang; Tao Qin
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Paper Abstract

In order to improve photolithographic resolution and focal depth of a projection photolithographic imaging system with an enough large numerical aperture, the basic principle of pupil phase-shift filtering has been investigated in detail. The mathematical model of filtering, the simulation and the photolithographic experiments have been carried. The theoretical analysis and experimental results show that both the photolithographic resolution and focal depth have been obviously improved with pupil phase-shift filtering. At the same time, the photolithographic window has been increased. Compared with amplitude filtering, the utilization of light energy and the potential ability to improve image quality of the phase filtering technique is fully excavated. It is an effective wavefront engineering technique for improving both photolithographic resolution and focal depth.

Paper Details

Date Published: 25 September 2003
PDF: 6 pages
Proc. SPIE 5286, Third International Symposium on Multispectral Image Processing and Pattern Recognition, (25 September 2003); doi: 10.1117/12.538826
Show Author Affiliations
Xunan Chen, Institute of Optics and Electronics, CAS (China)
Jianping Shi, Institute of Optics and Electronics, CAS (China)
Xiangang Luo, Institute of Optics and Electronics, CAS (China)
Xiqiao Kang, Institute of Optics and Electronics, CAS (China)
Tao Qin, Institute of Optics and Electronics, CAS (China)


Published in SPIE Proceedings Vol. 5286:
Third International Symposium on Multispectral Image Processing and Pattern Recognition
Hanqing Lu; Tianxu Zhang, Editor(s)

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