Share Email Print
cover

Proceedings Paper

Fabrication of high-resolution gratings for polymeric optical waveguide devices
Author(s): Shinya Shibata; Okihiro Sugihara; Toshikuni Kaino; Naomichi Okamoto
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.

Paper Details

Date Published: 18 June 2004
PDF: 7 pages
Proc. SPIE 5351, Organic Photonic Materials and Devices VI, (18 June 2004); doi: 10.1117/12.538777
Show Author Affiliations
Shinya Shibata, Tohoku Univ. (Japan)
Okihiro Sugihara, Tohoku Univ. (Japan)
Toshikuni Kaino, Tohoku Univ. (Japan)
Naomichi Okamoto, Shizuoka Univ. (Japan)


Published in SPIE Proceedings Vol. 5351:
Organic Photonic Materials and Devices VI
James G. Grote; Toshikuni Kaino, Editor(s)

© SPIE. Terms of Use
Back to Top