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Proceedings Paper

Fabrication of high-resolution gratings for polymeric optical waveguide devices
Author(s): Shinya Shibata; Okihiro Sugihara; Toshikuni Kaino; Naomichi Okamoto
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Paper Abstract

High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.

Paper Details

Date Published: 18 June 2004
PDF: 7 pages
Proc. SPIE 5351, Organic Photonic Materials and Devices VI, (18 June 2004); doi: 10.1117/12.538777
Show Author Affiliations
Shinya Shibata, Tohoku Univ. (Japan)
Okihiro Sugihara, Tohoku Univ. (Japan)
Toshikuni Kaino, Tohoku Univ. (Japan)
Naomichi Okamoto, Shizuoka Univ. (Japan)

Published in SPIE Proceedings Vol. 5351:
Organic Photonic Materials and Devices VI
James G. Grote; Toshikuni Kaino, Editor(s)

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