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Proceedings Paper

Step and Repeat UV nanoimprint lithography tools and processes
Author(s): Ian McMackin; Jin Choi; Philip Schumaker; Van Nguyen; Frank Xu; Ecron Thompson; Daniel Babbs; S. V. Sreenivasan; Mike Watts; Norman Schumaker
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Paper Abstract

Step and FlashTM Imprint Lithography (S-FILTM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current status of the S-FIL tool and process technology is presented in this paper. The specific topics that are covered include: • Residual layer control • Etch process development • Patterning of lines, contacts and posts • CD control • Defect and process life • Alignment and magnification control

Paper Details

Date Published: 20 May 2004
PDF: 10 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.538733
Show Author Affiliations
Ian McMackin, Molecular Imprints, Inc. (United States)
Jin Choi, Molecular Imprints, Inc. (United States)
Philip Schumaker, Molecular Imprints, Inc. (United States)
Van Nguyen, Molecular Imprints, Inc. (United States)
Frank Xu, Molecular Imprints, Inc. (United States)
Ecron Thompson, Molecular Imprints, Inc. (United States)
Daniel Babbs, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)
Mike Watts, Molecular Imprints, Inc. (United States)
Norman Schumaker, Molecular Imprints, Inc. (United States)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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