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Proceedings Paper

Status of Philips' extreme UV source
Author(s): Joseph Pankert; Klaus Bergmann; Juergen Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Sven Probst; Dominik Vaudrevange; Guido Siemons; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Guenther Derra; Thomas Kruecken; Peter Zink
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Paper Abstract

The paper describes progress of the Philips’ hollow cathode triggered (HCT) gas discharge EUV source. The program has been focussed on three major areas: (1) Studying the basic physics of ignition, pinch formation and EUV generation. The paper reports on progress in this area and particularly describes the underlying atomic physics both for Xe and Sn. (2) Discharge based on Sn. Results on overall efficiency more than 5 times the Xe efficiency are reported as well as high frequency operation up to 6.5 kHz. This system shows all the necessary ingredients for scaling to production power levels. (3) Integration of the Xe source in an alpha tool. Results on integration issues like electrode life time, collector life time and dose control will be presented.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.538041
Show Author Affiliations
Joseph Pankert, Philips Extreme UV GmbH (Germany)
Klaus Bergmann, Fraunhofer-Institut fuer Lasertecknik (Germany)
Juergen Klein, Fraunhofer-Institut fuer Lasertecknik (Germany)
Willi Neff, Fraunhofer-Institut fuer Lasertecknik (Germany)
Oliver Rosier, Fraunhofer-Institut fuer Lasertecknik (Germany)
Stefan Seiwert, Fraunhofer-Institut fuer Lasertecknik (Germany)
Christopher Smith, Fraunhofer-Institut fuer Lasertecknik (Germany)
Sven Probst, Fraunhofer-Institut fuer Lasertechnik (Germany)
Dominik Vaudrevange, Philips Extreme UV GmbH (Germany)
Guido Siemons, Philips Extreme UV GmbH (Germany)
Rolf Apetz, Philips Extreme UV GmbH (Germany)
Jeroen Jonkers, Philips Extreme UV GmbH (Germany)
Michael Loeken, Philips Extreme UV GmbH (Germany)
Guenther Derra, Philips Research Labs. (Germany)
Thomas Kruecken, Philips Research Labs. (Germany)
Peter Zink, Philips Research Labs. (Germany)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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