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Dye-sensitized solar cells using laser processing technologies
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Paper Abstract

Laser processing techniques, such as laser direct-write (LDW) and laser sintering, have been used to deposit mesoporous nanocrystalline TiO2 (nc-TiO2) films for use in dye-sensitized solar cells. LDW enables the fabrication of conformal structures containing metals, ceramics, polymers and composites on rigid and flexible substrates without the use of masks or additional patterning techniques. The transferred material maintains a porous, high surface area structure that is ideally suited for dye-sensitized solar cells. In this experiment, a pulsed UV laser (355nm) is used to forward transfer a paste of commercial TiO2 nanopowder (P25) onto transparent conducting electrodes on flexible polyethyleneterephthalate (PET) and rigid glass substrates. For the cells based on flexible PET substrates, the transferred TiO2 layers were sintered using an in-situ laser to improve electron paths without damaging PET substrates. In this paper, we demonstrate the use of laser processing techniques to produce nc-TiO2 films (~10 μm thickness) on glass for use in dye-sensitized solar cells (Voc = 690 mV, Jsc = 8.7 mA/cm2, ff = 0.67, η = 4.0 % at 100 mW/cm2). This work was supported by the Office of Naval Research.

Paper Details

Date Published: 15 July 2004
PDF: 9 pages
Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); doi: 10.1117/12.537903
Show Author Affiliations
Heungsoo Kim, Naval Research Lab. (United States)
Alberto Pique, Naval Research Lab. (United States)
Gary P. Kushto, Naval Research Lab. (United States)
Raymond C. Y. Auyeung, Naval Research Lab. (United States)
S. H. Lee, Naval Research Lab. (United States)
Craig B. Arnold, Princeton Univ. (United States)
Zakia H. Kafafi, Naval Research Lab. (United States)

Published in SPIE Proceedings Vol. 5339:
Photon Processing in Microelectronics and Photonics III
Jan J. Dubowski; Peter R. Herman; Friedrich G. Bachmann; Willem Hoving; Jim Fieret; David B. Geohegan; Frank Träger; Kunihiko Washio; Alberto Pique; Xianfan Xu; Tatsuo Okada, Editor(s)

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