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Proceedings Paper

Metal-oxide lift-off for optimized heterointegration of photonic circuits
Author(s): Tomoyuki Izuhara; Ryan Roth; Djordje Djukic; Antonije M. Radojevic; Richard M. Osgood Jr.; Sasha Bakhru; Hassaram Bakhru
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Paper Abstract

Crystal ion slicing can fabricate microns-thin-films from bulk, single-crystal metal oxides, which are important materials in optical, microwave, and electrical applications. These thin-films maintain single-crystal properties, which are very difficult to achieve in other thin-film technologies such as epitaxial growth. In this paper, ion-slicing technique is reviewed briefly from a process, material, and device perspective. The demonstrated applications in integrated optics are listed, along with a complete reference to ion-slicing related publications.

Paper Details

Date Published: 14 June 2004
PDF: 7 pages
Proc. SPIE 5356, Optoelectronic Integrated Circuits VI, (14 June 2004); doi: 10.1117/12.537850
Show Author Affiliations
Tomoyuki Izuhara, Columbia Univ. (United States)
Ryan Roth, Columbia Univ. (United States)
Djordje Djukic, Columbia Univ. (United States)
Antonije M. Radojevic, Columbia Univ. (United States)
Richard M. Osgood Jr., Columbia Univ. (United States)
Sasha Bakhru, Univ. at Albany (United States)
Hassaram Bakhru, Univ. at Albany (United States)

Published in SPIE Proceedings Vol. 5356:
Optoelectronic Integrated Circuits VI
Louay A. Eldada, Editor(s)

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