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Proceedings Paper

Evaporation and phase explosion during laser-induced forward transfer of aluminum
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Paper Abstract

Laser-Induced Forward Transfer (LIFT) of aluminum films was performed using a 7 ns Nd:YAG laser operating at 1064 nm. Aluminum films of 200 nm and 1 micron thickness were supported on glass substrates prior to transfer. Films were irradiated at the interface between the film and donor substrate using contact and non-contact configurations. Direct contact occurred between film and acceptor in contact mode, and non-contact mode used a gap of the order of tens of micrometers. Three transfer regimes were observed in contact mode- 1) single droplets or a ring-like structure with dimensions similar to or smaller than the laser spot size at low fluences, and 2) localized material transfer near the center of the laser spot above a threshold value of laser fluence, and 3) spattered material spreading outside of the laser spot. In non-contact mode at fluences below the contact mode spatter threshold, the transferred spot consisted of small droplets until reaching the spatter regime. The ring structure in contact mode is interpreted in terms of flow of molten aluminum resulting from Marangoni flow. The LIFT process observed in non-contact mode is interpreted in terms of evaporation at low fluences and phase explosion at high fluences.

Paper Details

Date Published: 15 July 2004
PDF: 9 pages
Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); doi: 10.1117/12.537566
Show Author Affiliations
David A. Willis, Southern Methodist Univ. (United States)
Vicentiu Grosu, Southern Methodist Univ. (United States)


Published in SPIE Proceedings Vol. 5339:
Photon Processing in Microelectronics and Photonics III
Jan J. Dubowski; Peter R. Herman; Friedrich G. Bachmann; Willem Hoving; Jim Fieret; David B. Geohegan; Frank Träger; Kunihiko Washio; Alberto Pique; Xianfan Xu; Tatsuo Okada, Editor(s)

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