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Proceedings Paper

Current status of Nanonex nanoimprint solutions
Author(s): Hua Tan; Linshu Kong; Mingtao Li; Colby Steere; Larry Koecher
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Paper Abstract

Nanoimprint lithography (NIL) has the advantage of high-throughput, sub-10 nm resolution and low cost [1]. It has been included into 2003 ITRS as the Next Generation Lithography (NGL) for 45 nm node [2]. This paper summarized current status of Nanonex imprint technologies. Nanonex imprint process includes thermal nanoimprint (T-NIL) and photo-curable nanoimprint (P-NIL). Both T-NIL and P-NIL utilized a proprietary air cushion press (ACP), which has the advantage of ultra-uniformity, low lateral stress, less damage to the mold and substrate, and higher alignment accuracy. Nanonex Corporation delivers user-friendly nanoimprint lithography tools and solutions for both experts and non-experts of micro and nanofabrication. Nanoimprint machines, resists, molds and processes have been developed and are available today.

Paper Details

Date Published: 20 May 2004
PDF: 9 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.537241
Show Author Affiliations
Hua Tan, Nanonex Corp. (United States)
Linshu Kong, Nanonex Corp. (United States)
Mingtao Li, Nanonex Corp. (United States)
Colby Steere, Nanonex Corp. (United States)
Larry Koecher, Nanonex Corp. (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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