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Proceedings Paper

Design and fabrication of advanced EUV diffractive elements
Author(s): Patrick P. Naulleau; James Alexander Liddle; Farhad Salmassi; Erik H. Anderson; Eric M. Gullikson
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Paper Abstract

As extreme ultraviolet (EUV) lithography approaches commercial reality, the development of EUV-compatible diffractive structures becomes increasingly important. Such devices are relevant to many aspects of EUV technology including interferometry, illumination, and spectral filtering. Moreover, the current scarcity of high power EUV sources makes the optical efficiency of these diffractive structures a paramount concern. This fact has led to a strong interest in phase-enhanced diffractive structures. Here we describe recent advancements made in the fabrication of such devices.

Paper Details

Date Published: 29 December 2003
PDF: 9 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.537195
Show Author Affiliations
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
James Alexander Liddle, Lawrence Berkeley National Lab. (United States)
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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