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Characterization of flare in 157-nm lithography systems
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Proc. SPIE 5377, Optical Microlithography XVII, ; doi: 10.1117/12.537081
Show Author Affiliations
Ivan Lalovic, Advanced Micro Devices, Inc. (United States)
Bruno LaFontaine, Advanced Micro Devices, Inc. (United States)
Harry Levinson, Advanced Micro Devices, Inc. (United States)
Uzodinma Okoroanyanwu, Advanced Micro Devices, Inc. (United States)
Jeff Meute, International SEMATECH (United States)
Karen Turnquest, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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