Share Email Print
cover

Proceedings Paper

High-throughput EUV reflectometer for EUV mask blanks
Author(s): Rainer Lebert; Christian Wies; Larissa Juschkin; Bernhard Jaegle; Manfred Meisen; Lutz Aschke; Frank Sobel; Holger Seitz; Frank Scholze; Gerhard Ulm; Konstantin Walter; Willi Neff; Klaus Bergmann; Wolfgang Biel
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A prototype of a reflectometer for masks and mask blanks has been set-up in autumn 2003 for in-house quality check of EUV mask blanks at Schott Lithotec. The target specifications are those under discussion as SEMI standard for EUV mask blank reflectometry. Additionally, the identified demands for semiconductor capital investment for future actinic EUV metrology, high throughputs and small measuring spots, were taken into account for the tool development. Effective use of the emission from a laboratory discharge source is achieved by using polychromatic reflectometry, which has been shown to deliver results about a factor of 100 faster with the same source power and needs less mechanical overhead than a monochromatic reflectometer. The hardware concept, first results and discussion of a test of the performance with respect to resolution, uncertainty and reproducibility will be represented. Jointly with the Physikalisch-Technische Bundesanstalt’s laboratory for radiometry at BESSY II the traceability to storage ring metrology, the calibration and the validation of the concepts will be assessed.

Paper Details

Date Published: 20 May 2004
PDF: 10 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.537012
Show Author Affiliations
Rainer Lebert, AIXUV GmbH (Germany)
Christian Wies, AIXUV GmbH (Germany)
Larissa Juschkin, AIXUV GmbH (Germany)
Bernhard Jaegle, AIXUV GmbH (Germany)
Manfred Meisen, AIXUV GmbH (Germany)
Lutz Aschke, Schott Lithotec AG (Germany)
Frank Sobel, Schott Lithotec AG (Germany)
Holger Seitz, Schott Lithotec AG (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Konstantin Walter, Fraunhofer-Institut fuer Lasertechnik (Germany)
Willi Neff, Fraunhofer-Institut fuer Lasertechnik (Germany)
Klaus Bergmann, Fraunhofer-Institut fuer Lasertechnik (Germany)
Wolfgang Biel, Forschungszentrum Juelich GmbH, EURATOM Association (Germany)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top