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Proceedings Paper

Development of high-power ArF/F2 laser platform for VUV microlithography
Author(s): Kouji Kakizaki; Junichi Fujimoto; Taku Yamazaki; Toru Suzuki; Takashi Matsunaga; Yasufumi Kawasuji; Yukio Watanabe; Masashi Kaminishi; Toyoharu Inoue; Hakaru Mizoguchi; Takahito Kumazaki; Tatsuya Ariga; Takayuki Watanabe; Takayuki Yabu; Koutarou Sasano; Tsukasa Hori; Osamu Wakabayashi; Akira Sumitani
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Paper Abstract

New light source technology for ArF lithography under 65nm node is introduced. That is “GigaTwin” platform based on “Injection Lock” technology. The new product named GT40A is 60W (4000Hz, 15mJ), 0.18pm high power ultra narrowed ArF laser. The “Injection Lock” technology provides higher performance and lower CoO. GT40A has enabled the target of more than 60ns pulse duration by natural long pulse and optical pulse stretcher. Combination of “Injection Lock” technology and Gigaphoton’s key technologies; “Higher resolution” technology, “Magnetic bearing” technology and “G-electrode” technology promise durable and reliable performance of GT40A. These technologies enable the target of chamber maintenance interval more than 12 billion pulses. The GT40A will be release into market by 4Q 2004. We introduce latest development data of GT40A, which is developed new high power “Injection Lock” laser platform for VUV/DUV lithography system.

Paper Details

Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.536846
Show Author Affiliations
Kouji Kakizaki, Ushio Inc. (Japan)
Junichi Fujimoto, Komatsu Ltd. (Japan)
Taku Yamazaki, Komatsu Ltd. (Japan)
Toru Suzuki, Komatsu Ltd. (Japan)
Takashi Matsunaga, Komatsu Ltd. (Japan)
Yasufumi Kawasuji, Komatsu Ltd. (Japan)
Yukio Watanabe, Komatsu Ltd. (Japan)
Masashi Kaminishi, Komatsu Ltd. (Japan)
Toyoharu Inoue, Ushio Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Takahito Kumazaki, Komatsu Ltd. (Japan)
Tatsuya Ariga, Komatsu Ltd. (Japan)
Takayuki Watanabe, Komatsu Ltd. (Japan)
Takayuki Yabu, Komatsu Ltd. (Japan)
Koutarou Sasano, Komatsu Ltd. (Japan)
Tsukasa Hori, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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