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Proceedings Paper

General scaling law of optical lithography: optical theory
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Paper Abstract

The concept of system invariance is the principle of scaling law in optical lithography. Both the conservation of the intensity threshold of the aerial image and the invariant pupil filling of the diffracted light with the normalized numerical aperture (NA) have to be satisfactory in order to ensure the invariance for a system in a variety of optical settings. Two well-known scaling equations with k1 and k2 factors characterize the capability of the manufacturing process in microlithography. In theory, the validity of these two equations has to be based on the principle of invariance. Therefore, any optical parameters in exposure tool could be scaling validly and properly, once they obey the principle of invariance.

Paper Details

Date Published: 28 May 2004
PDF: 12 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.536667
Show Author Affiliations
Chun-Kuang Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Tsai-Sheng Gau, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Li-Jui Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chi-Chuang Lee, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jaw-Jung Shin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Anthony Yen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Burn-Jeng Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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